The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 1981
Filed:
Aug. 08, 1979
Applicant:
Inventors:
Urbain L Laridon, Wilrijk, BE;
August M Marien, Oevel, BE;
Walter F De Winter, s'-Gravenwezel, BE;
Hendrik E Kokelenberg, Merksem, BE;
Assignee:
AGFA-GEVAERT N.V., Mortsel, BE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430281 ; 20415918 ; 20415923 ; 430287 ; 430288 ; 430910 ; 430916 ; 430919 ;
Abstract
A photosensitive material is described which comprises a base and a solid photosensitive layer comprising a photopolymerizable compound and a photopolymerization initiating mixture consisting of an oxime ester, a photopolymerization initiator and a p-dialkylaminobenzene of the formula ##STR1## wherein R.sup.1 and R.sup.2 are lower alkyl, R.sup.3 is hydrogen, alkyl, alkoxy or N(R.sup.1) (R.sup.2) and X is --CO--, --CS--, CH.sub.2, or --CH(OH)--.Synergistic photocuring sensitivity is obtained by said oxime ester in admixture with said p-dialkyl aminobenzene compound.