Agfa Gevaert Nv

Other

Urbain Leopold Laridon

Hendrik E Kokelenberg

Albert Lucien Poot

Jozef Frans Willems

Walter F De Winter

August M Marien

Raymond Gerard Lemahieu

Rafael P Samijn

Gerard Albert Delzenne

Jozef Willy Van Den Houte

Bernhard Seidel

Rene Alois Van Brandt

Helmut Mader

Walter F DeWinter

Hans Ulrich

A photosensitive recording material which includes in a supported layer a mixture of photosensitive substances in admixture with one or more polymers that are soluble in an alkaline aqueous liquid, characterized in that such mixture of photosensitive substances essentially consists of: (A) at least one photosensitive nitrone of the formula: ##STR1## in which: R is an aromatic hydrocarbon group including a substituted aromatic hydrocarbon group,

Photoresist materials and processes of using with photosensitive

A photosensitive composition of matter suited for the production of polymer resist images which composition comprises a mixture of:

Photosensitive composition containing an ethylenically unsaturated

A photosensitive material is described which comprises a base and a solid photosensitive layer comprising a photopolymerizable compound and a photopolymerization initiating mixture consisting of an oxime ester, a photopolymerization initiator and a p-dialkylaminobenzene of the formula ##STR1## wherein R.sup.1 and R.sup.2 are lower alkyl, R.sup.3 is hydrogen, alkyl, alkoxy or N(R.sup.1) (R.sup.2) and X is --CO--, --CS--, CH.sub.2, or --CH(OH)--.Synergistic photocuring sensitivity is obtained by said oxime ester in admixture with said p-dialkyl aminobenzene compound.

Photopolymerizable recording materials

A recording process, wherein an organic reducing compound being present in a supported or self-supporting layer and corresponding to one of the following general formulae (I) and (II): ##STR1## wherein: R.sub.1 represents hydrogen, an aliphatic group or a cycloaliphatic group, and

Thermographic material

Photo-sensitive film-forming soluble polymeric materials containing one or two polymers which can be insolubilized photochemically are disclosed. These polymeric materials contain in the same or different polymers (A) components which are reactive with moieties obtained by the photochemical decomposition of azidosulphonyl groups, e.g., a hydroxyl radical, pyridine, a phenyl radical, or a lactam radical; and (B) azidosulphonyl groups. The photo-sensitive material is insolubilized by exposure to actinic light. The material is useful in the production of photographic resists, printing plates for lithography, and the like.

Film-forming light-sensitive polymeric material carrying azidosulfonyl

A method for the preparation of a planographic printing plate wherein a sheet material comprising an outer hardenable hydrophilic colloid layer on whose surface is concentrated a visible silver image that has been formed thereon from silver halide complexes according to the silver complex diffusion transfer process, is treated with an aqueous lithographic fixer having a pH in the range of 1.0 to 6.5 and containing

Fixer compositions used in planographic printing containing onium

A photosensitive recording material that is capable of producing directly a visible image as a result of an image-wise exposure to activating electromagnetic radiation and which contains an intimate mixture comprising:

Photosensitive material containing an organic polyhalogen compound and a

A recording process, wherein an organic reducing compound being present in a supported or self-supporting layer and corresponding to one of the following general formulae (I) and (II): ##EQU1## wherein: R.sub.1 represents hydrogen, an aliphatic group of a cycloaliphatic group, and

Thermographic recording process

A photographic process wherein a visible image is formed by print-out or optical development in a recording material comprising in intimate admixture a spiropyran compound, an ultra-violet light-sensitive compound capable of producing an exposure with ultra-violet light with the spiropyran a dye salt and as sensitizing agent an organic nitrogen containing compound having a thiol group or in its tautomeric form a thione group as represented in the following tautomeric structural parts : ##EQU1## Preferred recording materials contain a spirodinaphthopyran compound, carbon tetrabromide and/or iodoform and as sensitizing agent 2-mercaptobenzthiazole in conjunction with a triaryl stibine as antifogging agent.

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Wilrijk, Belgium

Urbain Leopold Laridon