Tzu-Hao Huang

Title: Tzu-Hao Huang: Innovating Integrated Circuit Technologies

Introduction

Tzu-Hao Huang, a prominent inventor based in Hsinchu County, Taiwan, has made significant contributions to the field of integrated circuits. With a total of two patents to his name, his innovative methodologies have advanced the techniques used in modern semiconductor manufacturing.

Latest Patents

Huang's latest patents focus on methods of patterning small via pitch dimensions in integrated circuit technology. The patented methods detail a comprehensive process that includes providing a photomask equipped with two main features for two via openings, along with an optical proximity correction (OPC) feature linking these main features. The process further involves forming a hard mask layer on a substrate that contains two trench openings. Following this, a patterned resist layer is created over the hard mask layer using the photomask, resulting in a peanut-shaped opening with two end portions aligned with the trench openings of the hard mask layer. The final step includes performing a first etch process on the substrate utilizing both the hard mask layer and the patterned resist layer as a combined etch mask.

Career Highlights

Currently, Tzu-Hao Huang is associated with Taiwan Semiconductor Manufacturing Company Limited (TSMC), one of the leading firms in the semiconductor industry. His work primarily focuses on enhancing patterning techniques in integrated circuits, critical for the ongoing development of smaller, more efficient semiconductor devices.

Collaborations

Throughout his career, Huang has collaborated with notable colleagues such as Chung-Yi Lin and Jiing-Feng Yang. These partnerships have allowed for the exchange of ideas and expertise, fostering innovation and pushing the boundaries of integrated circuit design.

Conclusion

With his contributions to the field of semiconductor manufacturing, Tzu-Hao Huang continues to be a key player in the advancement of integrated circuit technologies. His patents not only highlight his inventive spirit but also signify the ongoing evolution within the semiconductor industry, paving the way for more efficient and advanced technologies in the future.