Company Filing History:
Years Active: 2007-2014
Title: Tzu Chin Chuang: Innovator in Substrate Analysis Technologies
Introduction
Tzu Chin Chuang is a notable inventor based in Cupertino, CA, who has made significant contributions to the field of substrate analysis. With a total of 2 patents, his work focuses on advanced methods and systems that enhance the measurement and preparation of substrates for analysis.
Latest Patents
Chuang's latest patents include innovative methods for measuring characteristics of substrates and preparing them for analysis. One method involves using an electron beam to remove a portion of a feature on the substrate, exposing a cross-sectional profile for measurement. This technique is particularly useful for photoresist features. Additionally, he has developed methods for preparing substrates by removing material near defects using chemical etching combined with electron and light beams. These advancements aim to improve the accuracy and reliability of substrate analysis.
Career Highlights
Tzu Chin Chuang is currently employed at Kla-Tencor Technologies Corporation, where he applies his expertise in metrology and substrate analysis. His work has been instrumental in developing systems that reduce distortion during measurement processes, ensuring that resist features remain intact and accurate.
Collaborations
Chuang has collaborated with notable colleagues such as Mark Borowicz and Rudy Flores Garcia, contributing to a dynamic team focused on innovation in substrate analysis technologies.
Conclusion
Tzu Chin Chuang's contributions to substrate analysis through his patents and work at Kla-Tencor Technologies Corporation highlight his role as a key innovator in the field. His advancements continue to influence the methods used in substrate measurement and preparation, showcasing the importance of innovation in technology.