This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Tzi-Wen Chen and Semiconductor Lithography Innovation.
Introduction
Tzi-Wen Chen is an inventor associated with Hsinchu, Taiwan, and Taiwan Semiconductor Manufacturing Co., Ltd. Her patent work concerns lithography technology used to form features in semiconductor devices.
Latest Patents
Chen is listed with 1 patent: “Lithography System and Methods.” The disclosed method uses a frame to protect a mask during movement toward a substrate region. The frame’s height is set below the focal plane associated with a selected particle size. Extreme ultraviolet (EUV) radiation is directed toward the mask, and the patterned radiation is reflected toward a mask layer to form a semiconductor-device feature in an underlying layer.
Career Highlights
Chen’s listed invention addresses mask protection and pattern transfer in EUV lithography, a process used in semiconductor manufacturing. Her work is associated with Taiwan Semiconductor Manufacturing Co., Ltd.
Collaborations
The provided information names Ming-Hsin Chen and Chi Yang as Chen’s coworkers. It does not specify their roles in the patent or describe particular collaborative contributions.
Conclusion
Tzi-Wen Chen’s listed patent focuses on protecting a lithography mask and transferring its pattern to support semiconductor-device fabrication.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile