Company Filing History:
Years Active: 2015-2017
Title: Tz-Wei Lin: Innovator in Semiconductor Technology
Introduction
Tz-Wei Lin is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on advanced process control methods that enhance the manufacturing of semiconductor devices.
Latest Patents
One of Tz-Wei Lin's latest patents is an advanced process control method for controlling the width of a spacer in a semiconductor device. This method involves several steps, including providing a semiconductor substrate and a target width for a gate. The process includes forming the gate on the substrate, depositing a dielectric layer, and determining a trim time based on various measurements. This innovative approach aims to improve the precision of semiconductor manufacturing.
Another patent by Tz-Wei Lin also pertains to advanced process control methods for semiconductor devices. It similarly focuses on controlling the width of spacers and dummy sidewalls, emphasizing the importance of accuracy in the semiconductor fabrication process.
Career Highlights
Tz-Wei Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His role involves developing and refining processes that contribute to the efficiency and effectiveness of semiconductor production.
Collaborations
Throughout his career, Tz-Wei Lin has collaborated with notable colleagues, including Hsien-Chieh Tsai and Sheng-Jen Yang. These partnerships have fostered innovation and advancement in semiconductor technologies.
Conclusion
Tz-Wei Lin's contributions to semiconductor technology through his patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key innovator in the field. His advancements in process control methods are paving the way for more efficient semiconductor manufacturing.