Shanghai, China

Tuqiang Ni

USPTO Granted Patents = 5 

Average Co-Inventor Count = 4.5

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2024-2025

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5 patents (USPTO):Explore Patents

Title: Innovator of Semiconductor Temperature Control: The Work of Tuqiang Ni

Introduction: In the dynamic field of semiconductor processing, innovation is crucial. One such innovator is Tuqiang Ni, based in Shanghai, China. With a total of five patents to his name, Tuqiang has made significant contributions, particularly in temperature control technologies for semiconductor equipment.

Latest Patents: Among Tuqiang Ni's latest patents are two groundbreaking inventions. The first is a temperature control apparatus for semiconductor processing equipment, which details a method where each heating element in a matrix forms a power return circuit with the same power source. This invention simplifies circuit complexity while ensuring temperature control accuracy, leading to a uniform and flexible temperature control result. The second patent revolves around a control method for a multi-zone active-matrix temperature control in plasma processing apparatus, which incorporates a matrix of temperature control modules. This system enhances the efficiency of temperature regulation, making it critical in modern semiconductor processes.

Career Highlights: Throughout his career, Tuqiang Ni has been associated with Advanced Micro-fabrication Equipment Inc. China and Advanced Micro-fabrication Equipment, Inc. His experience in these companies has allowed him to sharpen his skills in semiconductor manufacturing technologies, specifically focusing on improving temperature control systems.

Collaborations: Tuqiang Ni has collaborated with esteemed professionals such as Kui Zhao and Sha Rin. Their collective efforts in research and development have significantly advanced the field of semiconductor temperature control technologies, paving the way for further innovations.

Conclusion: Tuqiang Ni's contributions to semiconductor technology through his innovative patents highlight the importance of continual advancements in this critical area. His work not only enhances operational efficiency but also ensures high precision in temperature control, making it invaluable for the future of semiconductor processing.

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