The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2025
Filed:
Feb. 24, 2022
Advanced Micro-fabrication Equipment Inc. China, Shanghai, CN;
Tuqiang Ni, Shanghai, CN;
Sheng Guo, Shanghai, CN;
Xiang Sun, Shanghai, CN;
Guangwei Fan, Shanghai, CN;
Kuan Yang, Shanghai, CN;
Hongqing Wang, Shanghai, CN;
Xingjian Chen, Shanghai, CN;
Ruoxin Du, Shanghai, CN;
ADVANCED MICRO-FABRICATION EQUIPMENT INC., Shanghai, CN;
Abstract
Disclosed is a plasma treatment apparatus, a lower electrode assembly and a forming method thereof, wherein the lower electrode assembly includes: a base for carrying a substrate to be treated; a focus ring encircling a periphery of the base; a coupling loop disposed below the focus ring; a conductive layer disposed in the coupling loop; and a wire for electrically connecting the conductive layer and the base so that the base and the conducting layer are equipotential. The lower electrode assembly is less prone to cause arc discharge.