Shanghai, China

Guangwei Fan

This inventor holds 1 USPTO granted patent. Top assignee: Advanced Micro-Fabrication Equipment, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Guangwei Fan. Retrieved from https://idiyas.com/inventor/guangwei-fan-xy2rpy9f

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Guangwei Fan

Introduction

Guangwei Fan is a notable inventor based in Shanghai, China. He has made significant contributions to the field of plasma treatment technology. His work focuses on enhancing the efficiency and safety of plasma treatment apparatuses.

Latest Patents

Guangwei Fan holds a patent for a "Plasma treatment apparatus, lower electrode assembly and forming method thereof." This invention discloses a plasma treatment apparatus that includes a lower electrode assembly designed to minimize the risk of arc discharge. The assembly features a base for carrying a substrate, a focus ring, a coupling loop, a conductive layer, and a wire for electrical connection, ensuring that the base and the conductive layer are equipotential.

Career Highlights

Guangwei Fan is associated with Advanced Micro-fabrication Equipment, Inc., where he applies his expertise in micro-fabrication technologies. His innovative approach has led to advancements in the efficiency of plasma treatment processes.

Collaborations

He has collaborated with notable coworkers, including Tuqiang Ni and Sheng Guo, contributing to various projects within the company.

Conclusion

Guangwei Fan's contributions to plasma treatment technology exemplify the impact of innovation in the field. His patent reflects a commitment to improving safety and efficiency in micro-fabrication processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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