Ruoxin Du

Title: The Innovative Contributions of Ruoxin Du

Introduction

Ruoxin Du is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of plasma treatment technology, holding two patents that showcase his innovative approach to solving complex engineering challenges. His work has implications for various industries, particularly in semiconductor manufacturing.

Latest Patents

Ruoxin Du's latest patents include a plasma treatment apparatus and a lower electrode assembly, along with a forming method thereof. This plasma treatment apparatus features a lower electrode assembly that includes a base for carrying a substrate to be treated, a focus ring encircling the periphery of the base, a coupling loop disposed below the focus ring, and a conductive layer within the coupling loop. The design ensures that the base and the conductive layer are equipotential, significantly reducing the likelihood of arc discharge.

Another notable patent is for a system and method of sensing and removing residual charge from a processed wafer. This innovation addresses the issue of de-chucking failure, which can lead to wafer breakage or damage. The method involves applying a reverse polarity discharging DC voltage to an electrode embedded in an electrostatic chuck (ESC) that supports the wafer. A lift pin assembly is utilized to provide an outlet for the residual charge to ground, while a residual charge sensor measures the amount of charge, allowing for adjustments in subsequent operations.

Career Highlights

Ruoxin Du has worked with Advanced Micro-fabrication Equipment, Inc. Asia and Advanced Micro-fabrication Equipment, Inc. His experience in these companies has allowed him to refine his skills and contribute to advancements in micro-fabrication technologies.

Collaborations

Throughout his career, Ruoxin Du has collaborated with notable colleagues, including Tuqiang Q Ni and Jinyuan Chen. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the field.

Conclusion

Ruoxin Du's contributions to plasma treatment technology and his innovative patents highlight his role as a leading inventor in the industry. His work not only addresses current challenges but also paves the way for future advancements in semiconductor manufacturing.