Miaoli, Taiwan

Tung-Wen Hsieh

This inventor holds 2 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 1999-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tung-Wen Hsieh. Retrieved from https://idiyas.com/inventor/tung-wen-hsieh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 21(Granted Patents)


Location History:

  • Maio-Li, TW (1999)
  • Miaoli County, TW (2010)

Company Filing History:


Years Active: 1999-2010

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2 patents (USPTO):Explore Patents

Title: Innovations of Tung-Wen Hsieh

Introduction

Tung-Wen Hsieh is a notable inventor based in Miaoli County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to solving complex engineering challenges.

Latest Patents

One of his latest patents is titled "Method of fine pitch bump stripping." This invention provides a method for removing dry film resist (DFR) from a fine pitch solder bump array on a semiconductor wafer. The process involves pre-soaking the wafer in a chemical bath and then turbulently exposing it to a chemical solution, both steps occurring in batch processing with the wafers positioned vertically. Following this, the wafers undergo a chemical spinning operation where a solution is dispensed from a spray nozzle while the wafer is spun horizontally. The spin speed is increased to enhance the physical removal of any residue, and deionized water rinsing along with spin-drying ensures a solder bump array free of DFR or other residuals.

Another significant patent is the "Method and apparatus for feeding exhaust gases to a wet scrubber." This invention describes an exhaust gas conduit designed to feed exhaust gases to a scrubber. The conduit features a self-cleaning device mounted inside, which dispenses a cleaning solvent onto the inside wall of the outlet end to prevent solid depositions. This innovative approach also includes a method for preventing solid depositions in the exhaust gas inlet port to a wet scrubber, utilizing the self-cleaning device to maintain efficiency.

Career Highlights

Tung-Wen Hsieh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on enhancing manufacturing processes and improving the efficiency of semiconductor production.

Collaborations

He has collaborated with notable coworkers such as Kuo-Liang Lu and Bii-Junq Chang, contributing to various projects that aim to advance semiconductor technology.

Conclusion

Tung-Wen Hsieh's innovative patents and contributions to the semiconductor industry highlight his role as a significant inventor. His work continues to influence advancements in technology and manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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