Tung-Li Wu

Title: Tung-Li Wu: Innovator in Lithography Technology

Introduction

Tung-Li Wu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of lithography technology, holding a total of 6 patents. His work focuses on advancing the capabilities of extreme ultraviolet (EUV) lithography, which is crucial for the semiconductor manufacturing industry.

Latest Patents

Wu's latest patents include innovative designs aimed at improving the efficiency and effectiveness of lithography apparatus. One of his notable inventions is an EUV lithography apparatus and operating method for mitigating contamination. This apparatus features a light source that generates an EUV light beam, a scanner that directs the light to a reticle stage, and a debris catcher designed to capture contaminants along the EUV beam path. The debris catcher utilizes a network membrane composed of a plurality of nano-fibers, enhancing the apparatus's performance.

Another significant patent is for a lithography apparatus that incorporates dual reticle edge masking assemblies. This apparatus is designed to receive multiple light beams, with each assembly featuring a movable slit that allows light to pass through. The system includes a controller that adjusts the speed of the movable slit based on various parameters, such as the size of the slit and the intensity of the light beams. Additionally, the apparatus is equipped with a single mask configured to receive light from all assemblies, along with a projection lens that introduces immersion liquid into the space adjacent to it.

Career Highlights

Tung-Li Wu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at TSMC has positioned him as a key contributor to advancements in lithography technology, which is essential for producing smaller and more powerful semiconductor devices.

Collaborations

Wu collaborates with talented individuals in his field, including Jui-Chun Peng and Heng-Hsin Liu. These collaborations enhance the innovation process and contribute to the development of cutting-edge technologies in lithography.

Conclusion

Tung-Li Wu's contributions to lithography technology through his patents and work at TSMC highlight his role as a significant inventor in the semiconductor industry. His innovative approaches continue to shape the future of lithography and semiconductor manufacturing.