Tue Trong Phan

Title: Innovations of Tue Trong Phan in Thin Film Transistor Technology

Introduction

Tue Trong Phan is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of thin film transistors, particularly through his innovative methods and materials. With a total of two patents to his name, Phan's work is recognized for its technical depth and practical applications.

Latest Patents

Phan's latest patents focus on the manufacturing of thin film transistors utilizing oxide semiconductor channels. The first patent describes a thin film transistor that includes a gate electrode, a channel, and a gate insulating layer made of oxide containing lanthanum and zirconium. The channel is composed of channel oxide, which includes a first oxide containing indium, zinc, and zirconium with specific atomic ratios. The second patent reiterates similar innovations in thin film transistors, emphasizing the importance of the materials used in the channel and gate insulating layer.

Career Highlights

Tue Trong Phan is currently affiliated with the Japan Science and Technology Agency. His work has been pivotal in advancing the technology behind thin film transistors, which are essential components in various electronic devices. His research has contributed to the understanding and development of oxide semiconductors.

Collaborations

Phan has collaborated with notable colleagues such as Tatsuya Shimoda and Satoshi Inoue. Their combined expertise has further enhanced the research and development efforts in the field of thin film transistors.

Conclusion

Tue Trong Phan's contributions to thin film transistor technology highlight his innovative spirit and dedication to advancing electronic materials. His patents reflect a deep understanding of semiconductor technology, making him a key figure in this field.