Tokyo, Japan

Tsuyoshi Nagashima

USPTO Granted Patents = 13 

Average Co-Inventor Count = 1.8

ph-index = 3

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 2014-2025

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13 patents (USPTO):Explore Patents

Title: Tsuyoshi Nagashima: Innovator in Substrate and Gas Purification Technologies

Introduction

Tsuyoshi Nagashima is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the fields of substrate storage and gas purification, holding a total of 13 patents. His innovative designs have advanced the efficiency and functionality of various technologies.

Latest Patents

Nagashima's latest patents include a substrate storing container and a gas purge filter. The substrate storing container features a container body, a lid, and multiple substrate supports that ensure the edges of substrates are arranged parallel to each other. This design allows for optimal storage conditions while minimizing damage to the substrates. The gas purge filter is designed for use in housing containers, facilitating the ventilation of gases between the housing space and the external environment. It includes a filter housing with a ventilation space and an elastic pad that enhances its functionality.

Career Highlights

Throughout his career, Tsuyoshi Nagashima has worked with notable companies such as Miraial Co., Ltd. and Shin-Etsu Polymer Co., Ltd. His work in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Nagashima has collaborated with talented individuals in his field, including Takaharu Oyama and Chiaki Matsutori. These partnerships have fostered a creative environment that has led to the development of groundbreaking inventions.

Conclusion

Tsuyoshi Nagashima's contributions to substrate storage and gas purification technologies highlight his role as a leading inventor in Japan. His innovative patents and collaborations continue to influence the industry and pave the way for future advancements.

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