Location History:
- Aichi, JP (2004)
- Kasugai, JP (2009)
Company Filing History:
Years Active: 2004-2009
Title: Tsuyoshi Matsuda: Innovator in Polishing Compositions
Introduction
Tsuyoshi Matsuda is a notable inventor based in Kasugai, Japan. He has made significant contributions to the field of polishing compositions, particularly in applications related to semiconductor devices. With a total of 3 patents to his name, Matsuda's work has garnered attention for its innovative approaches to enhancing polishing methods.
Latest Patents
Matsuda's latest patents include a polishing composition and polishing method designed to improve the efficiency and effectiveness of semiconductor device manufacturing. One of his notable inventions is a polishing composition that contains a deterioration inhibitor, which helps maintain the polishing capability over time. This composition includes abrasives such as aluminum oxide and silicon dioxide, with a preference for fumed silica and colloidal silica. Another patent focuses on a polishing composition that incorporates a specific surfactant, silicon oxide, and various acids, along with a corrosion inhibitor and oxidant. This formulation aims to suppress dishing during the polishing process, making it particularly valuable for semiconductor applications.
Career Highlights
Throughout his career, Tsuyoshi Matsuda has worked with prominent companies in the industry, including Fujimi Incorporated and Fujima Incorporated. His experience in these organizations has allowed him to refine his expertise in polishing technologies and contribute to advancements in the field.
Collaborations
Matsuda has collaborated with several professionals in his field, including Kenji Sakai and Tatsuhiko Hirano. These partnerships have likely facilitated the exchange of ideas and innovations, further enhancing the quality of his work.
Conclusion
In summary, Tsuyoshi Matsuda is a distinguished inventor whose contributions to polishing compositions have made a significant impact on semiconductor manufacturing. His innovative patents and collaborations reflect his commitment to advancing technology in this critical area.