Kanazawa, Japan

Tsuyoshi Gouda

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsuyoshi Gouda. Retrieved from https://idiyas.com/inventor/tsuyoshi-gouda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Tsuyoshi Gouda: Innovator in Charging Apparatus Technology

Introduction

Tsuyoshi Gouda is a notable inventor based in Kanazawa, Japan. He has made significant contributions to the field of charging apparatus technology, particularly in the area of filtering resist liquids. His innovative approach aims to enhance the efficiency and reliability of such systems.

Latest Patents

Gouda holds a patent for a charging apparatus designed to reduce pressure fluctuations across a filter used for filtering resist liquids. This invention includes a charge liquid tank, a feed pump, a charge nozzle, a recovery passage, and a recovery valve. The control device in the apparatus manages servomotors to adjust the openings of the charge valve and recovery valve, ensuring stable pressure on both sides of the filter. He has 1 patent to his name.

Career Highlights

Tsuyoshi Gouda is associated with Tokyo Ohka Kogyo Co., Ltd., a company known for its advancements in chemical manufacturing and technology. His work has contributed to the development of more efficient systems in the industry.

Collaborations

Gouda has collaborated with talented coworkers, including Koji Nakagawa and Ryohei Nakamura. Their combined expertise has fostered innovation and progress in their projects.

Conclusion

Tsuyoshi Gouda's contributions to charging apparatus technology exemplify the spirit of innovation in the field. His work continues to influence advancements in filtering systems for resist liquids.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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