Jiangsu, China

Tsung-nten Hsu

This inventor holds 2 USPTO granted patents. Top assignee: Csmc Technologies Fab2 Co., Ltd.. Active years: 2015-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsung-nten Hsu. Retrieved from https://idiyas.com/inventor/tsung-nten-hsu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2015-2016

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2 patents (USPTO):Explore Patents

Title: Tsung-nten Hsu: Innovator in Memory Technology

Introduction

Tsung-nten Hsu is a notable inventor based in Jiangsu, China. He has made significant contributions to the field of memory technology, holding 2 patents that showcase his innovative approach to read-only memory and resistive random access storage units.

Latest Patents

One of his latest patents is a method for creating a read-only memory that includes a plurality of storage units arranged in an array. This memory features two types of storage units with different structures, specifically a first MOS transistor and a second MOS transistor. The first MOS transistor has a source and drain of the same type, while the second MOS transistor has an inverse type. This design allows for the storage of binary 0 and 1, respectively. The manufacturing method for this read-only memory is efficient, as it enables the simultaneous production of the same type of drain and source without the need for an extra mask plate, thus saving resources compared to conventional methods.

Another significant patent by Hsu is a method for manufacturing a resistive random access storage unit. This process involves forming a resistance layer on a flat first metal layer, followed by a passivation layer. An etching process is then performed to create multiple basic units, each comprising a first metal layer, a resistance layer, and a passivation layer. The method continues with the deposition of an insulating dielectric layer, which is then flattened and etched to form contacting holes. Metal wires are filled into these holes, and a second metal layer is formed. This innovative approach results in a uniformly distributed resistance across the entire wafer.

Career Highlights

Tsung-nten Hsu is currently employed at CSMC Technologies Fab2 Co., Ltd., where he continues to develop cutting-edge memory technologies. His work has positioned him as a key figure in the advancement of memory storage solutions.

Collaborations

Hsu has collaborated with notable colleagues, including Zhiyong Zhao and Chunshan Lu, contributing to the collective expertise in their field.

Conclusion

Tsung-nten Hsu's contributions to memory technology through his innovative patents demonstrate his commitment to advancing the field. His work not only enhances the efficiency of memory manufacturing but also paves the way for future developments in storage technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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