The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2015
Filed:
Oct. 22, 2012
Csmc Technologies Fab2 Co., Ltd., Jiangsu, CN;
Tsung-Nten Hsu, Jiangsu, CN;
Zhaoyu Yang, Jiangsu, CN;
Zhiyong Zhao, Jiangsu, CN;
Chunshan Lu, Jiangsu, CN;
CSMC TECHNOLOGIES FAB2 CO., LTD., Jiangsu, CN;
Abstract
A manufacturing method of a resistive random access storage unit, includes: forming a resistance layer on a first metal layer having a flat surface; forming a passivation layer on the resistance layer; performing an etching process to obtain a plurality of basic units, a basic unit comprising a first metal layer, a resistance layer, and a passivation layer, which are laminated sequentially; depositing a insulating dielectric layer, and flattening the insulating dielectric layer; etching the insulating dielectric layer and the passivation layer to form contacting holes corresponded to the basic units; filling metal wires in the contacting holes; forming a second metal layer. According to the above method, a uniformly distributed resistance can be formed on a whole wafer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile