Tsukasa Ohoka

Title: Tsukasa Ohoka: Innovator in Semiconductor Technology

Introduction

Tsukasa Ohoka is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. His innovative work has led to advancements in voltage generating apparatuses and methods for manufacturing semiconductor devices.

Latest Patents

One of his latest patents is a "Constant voltage generating apparatus with simple overcurrent/short-circuit protection circuit." This invention involves a control mechanism that generates a voltage detection signal based on the difference between the output voltage and a reference signal. Additionally, a current detection signal is generated to ensure the apparatus operates safely and efficiently.

Another notable patent is related to the "Method of manufacturing semiconductor devices." This method addresses the challenges of film deposition in thermal CVD processes, which can lead to reduced manufacturing yields. Ohoka's approach includes a cleaning process that utilizes ClF gas to remove unwanted films from the reaction chamber, thereby improving manufacturing efficiency and reducing costs.

Career Highlights

Throughout his career, Tsukasa Ohoka has worked with notable companies such as NEC Corporation and Hitachi Kokusai Electric Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the semiconductor industry.

Collaborations

Ohoka has collaborated with talented individuals in his field, including Atsushi Sano and Kensuke Okonogi. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Tsukasa Ohoka's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in manufacturing processes and voltage regulation systems.