Tsukasa Iida

Title: Tsukasa Iida: Innovator in Substrate Processing Technology

Introduction

Tsukasa Iida is a prominent inventor based in Toyama, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 5 patents. His work focuses on improving the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Iida's latest patents include a "Substrate Processing Apparatus and Recording Medium for Changing Atmosphere of Transfer Chamber." This invention features a configuration that includes an intake damper and an intake fan, which communicate with an intake port that sucks air into a transfer chamber connected to a process chamber. It also includes a valve for an inert gas introduction pipe, an exhaust fan, and a controller that manages the atmospheric conditions within the transfer chamber. Another notable patent is the "Substrate Processing Apparatus, Recording Medium and Method of Manufacturing Semiconductor Device." This apparatus consists of first and second process chambers, a mounting section for a housing vessel, and both vacuum and atmospheric transfer chambers, ensuring precise timing for substrate handling.

Career Highlights

Throughout his career, Tsukasa Iida has worked with notable companies such as Hitachi Kokusai Electric Inc. and Kokusai Electric Corporation. His experience in these organizations has allowed him to develop innovative solutions that enhance semiconductor processing.

Collaborations

Iida has collaborated with talented individuals in the industry, including Akihiko Yoneda and Kaori Inoshima. Their combined expertise has contributed to the advancement of substrate processing technologies.

Conclusion

Tsukasa Iida's contributions to substrate processing technology have made a significant impact on the semiconductor industry. His innovative patents and collaborations reflect his dedication to advancing manufacturing processes.