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For the Inventor, By the Inventor

Chiayi, Taiwan

Tse-Yi Lu

This inventor holds 5 USPTO granted patents and 1 published patent application. Top assignee: United Microelectronics Corp.. Active years: 2001-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tse-Yi Lu. Retrieved from https://idiyas.com/inventor/tse-yi-lu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5 

% Patents Active = 100.0

Average Co-Inventor Count = 1.6

ph-index = 2

Forward Citations = 23(Granted Patents)


Location History:

  • Hsin-Chu, TW (2001)
  • Chiayi, TW (2001 - 2017)

Company Filing History:

goldMedal5 out of 7,285 
 
United Microelectronics Corp.
 patents

Years Active: 2001-2017

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5 patents (USPTO):Explore Patents
1. 9841319 - Light detecting device (2017-12-12),
2. 6303467 - Method for manufacturing trench isolation (2001-10-16),
3. 6287909 - Method of fabricating a static random access memory (2001-09-11),
4. 6197629 - Method of fabricating a polysilicon-based load circuit for static random-access memory (2001-03-06),
5. 6171951 - Dual damascene method comprising ion implanting to densify dielectric layer and forming a hard mask layer with a tapered opening (2001-01-09),

Title: Tse-Yi Lu: Innovator in Light Detection Technology

Introduction

Tse-Yi Lu is a prominent inventor based in Chiayi, Taiwan. He has made significant contributions to the field of light detection technology, holding a total of 5 patents. His innovative work has paved the way for advancements in various applications.

Latest Patents

One of Tse-Yi Lu's latest patents is a light detecting device. This device comprises a substrate with a patterned metal layer, a dielectric layer, and two pixel elements. The design includes a first trench positioned below the first pixel element, enhancing the device's functionality. Another notable patent is a method for manufacturing trench isolation. This method involves defining a trench isolation over the substrate using photolithography and etching techniques. The process improves the sharp corners in the crossing region between the trench isolation and the active area, thereby enhancing the overall manufacturing process.

Career Highlights

Tse-Yi Lu is currently employed at United Microelectronics Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of light detection devices.

Collaborations

Tse-Yi Lu has collaborated with notable coworkers, including Yi-Min Jen and Tzung-Han Lee. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Tse-Yi Lu's contributions to light detection technology exemplify his innovative spirit and dedication to advancing the field. His patents and collaborations highlight his significant impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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