Tse Yao Huang

Title: Tse Yao Huang: Innovator in Semiconductor Technology

Introduction

Tse Yao Huang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His innovative approaches have advanced the methods used in fabricating semiconductor devices.

Latest Patents

Huang's latest patents include a "Method for Fabricating Self-Aligned Contact Hole." This invention outlines a process that begins with the formation of a conductive layer, a silicon oxide layer, and a first silicon nitride layer on a silicon substrate. The method continues with etching these layers to create a trench, followed by the formation of a BPSG layer and the definition of a photoresist layer. The process culminates in the creation of a self-aligned hole and the formation of a spacer through a second silicon nitride layer.

Another notable patent is the "Method for STI-Top Rounding Control." This patent describes a series of steps that involve providing a semiconductor substrate, forming an oxide layer, and creating a hard mask. The method includes etching the exposed hard mask and the underlying oxide layer, followed by the removal of part of the semiconductor substrate to form an STI trench.

Career Highlights

Tse Yao Huang is currently employed at Nan Ya Technology Corporation, where he continues to innovate in semiconductor fabrication techniques. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Huang collaborates with talented coworkers, including Shih-Chi Hsu and Yinan Chen. Their combined expertise contributes to the advancement of technology within their field.

Conclusion

Tse Yao Huang is a distinguished inventor whose work in semiconductor technology has led to several important patents. His innovative methods are shaping the future of semiconductor fabrication, making significant impacts in the industry.