The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2001
Filed:
Dec. 17, 1998
Applicant:
Inventors:
Shih-Chi Hsu, Chung-Li, TW;
Tse Yao Huang, Taipei, TW;
Assignee:
Nanya Technology Corporation, Taoyuan, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/13063 ;
U.S. Cl.
CPC ...
H01L 2/13063 ;
Abstract
This present invention provides methods for isolating interconnects characterized by first isolating the top and bottom interconnects with an IMD consisting of a traditional low-k dielectric material, then dissolving the low-k material with a suitable solvent and using air or a noble gas instead of the traditional low-k dielectric material to isolate the interconnects.