Location History:
- Taichung, TW (2001)
- Hsin-Chu, TW (2002 - 2004)
Company Filing History:
Years Active: 2001-2004
Title: Tsai-Sen Lin: Innovator in Semiconductor Technology
Introduction
Tsai-Sen Lin is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His innovative work focuses on improving processes and methods that enhance the performance and reliability of semiconductor devices.
Latest Patents
Among his latest patents, one notable invention is a method for preventing gate oxide thinning in a recess LOCOS process. This method involves creating a plurality of trenches separated by a patterned pad oxide and a patterned silicon nitride layer. The removal of these layers exposes the substrate's surface as an active area for the semiconductor device. An ion drive-in to the active area is performed by directing a flow of oxygen and nitrogen at a predetermined temperature, ensuring that silicon nitride does not form on the field oxide regions. Additionally, he has developed a method for detecting metal contamination on a silicon chip by implanting arsenic. This method allows for the quick detection of metal contaminants, such as iron, aluminum, or manganese, by observing the occurrence of silicon pits on the silicon chip.
Career Highlights
Tsai-Sen Lin is currently employed at Mosel Vitelic Corporation, where he continues to advance semiconductor technology. His work has been instrumental in developing methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Throughout his career, Tsai-Sen Lin has collaborated with notable colleagues, including Chon-Shin Jou and Chuan-Yi Wang. These collaborations have contributed to the advancement of innovative solutions in the semiconductor industry.
Conclusion
Tsai-Sen Lin's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a key innovator in the field. His work continues to influence the development of advanced semiconductor devices, ensuring improved performance and reliability.