Milton, VT, United States of America

Tracy Charles Hetrick

This inventor holds 4 USPTO granted patents. Top assignees: International Business Machines Corporation, Globalfoundries Inc.. Active years: 1997-2017.


% Patents Active = 50.0

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 389(Granted Patents)


Company Filing History:


Years Active: 1997-2017

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4 patents (USPTO):Explore Patents

Title: Tracy Charles Hetrick: Innovator in Vacuum Technology

Introduction

Tracy Charles Hetrick is a notable inventor based in Milton, VT (US). She has made significant contributions to the field of vacuum technology, holding a total of 4 patents. Her innovative work has advanced the efficiency and functionality of plasma etch systems.

Latest Patents

Among her latest patents is a vacuum trap designed for use in plasma etch systems. This vacuum trap features a baffle housing and a removable baffle assembly. The baffle assembly consists of a set of baffle plates that are strategically spaced along a support rod. These baffle plates are alternately positioned above and below the support rod, as well as in the upper and lower regions of the baffle housing. This design enhances the cleaning process of the vacuum trap, making it more effective and efficient.

Career Highlights

Tracy has worked with prominent companies in the technology sector, including IBM and Globalfoundries Inc. Her experience in these organizations has allowed her to refine her skills and contribute to groundbreaking projects in the field of vacuum technology.

Collaborations

Throughout her career, Tracy has collaborated with talented individuals such as Joseph K Comeau and David R Crawford. These partnerships have fostered innovation and have been instrumental in her development as an inventor.

Conclusion

Tracy Charles Hetrick is a pioneering inventor whose work in vacuum technology has made a lasting impact. Her patents and collaborations reflect her dedication to advancing the field and her commitment to innovation.

Profile summary based on public USPTO records.
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