International Business Machines Corporation

Globalfoundries Inc.

Tracy Charles Hetrick

Mousa H Ishaq

Joseph K Comeau

Anthony John Canale

Robert E Desrosiers

Dennis Stanley Grimard

David R Crawford

Randy Dean Cox

A vacuum trap, a plasma etch system using the vacuum trap and a method of cleaning the vacuum trap. The vacuum trap includes a baffle housing; and a removable baffle assembly disposed in the baffle housing, the baffle assembly comprising a set of baffle plates, the baffle plates spaced along a support rod from a first baffle plate to a last baffle plate, the baffle plates alternately disposed above and below the support rod and alternately disposed in an upper region and a lower region of the baffle housing.

Vacuum trap

A uniform gas flow is provided at the surface of a planar device or wafer in a processing system having a substantially cylindrical chamber through which processing gases flow toward an asymmetrically located outlet port by using an appropriately disposed collar or baffle along the gas stream in the chamber in the plane of the surface of the planar device or wafer.

Uniform gas flow arrangements

Growing community of inventors

Milton, VT, United States of America

Tracy Charles Hetrick