The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2015

Filed:

Mar. 21, 2012
Applicants:

Joseph K. Comeau, Alburgh, VT (US);

David Crawford, Essex Junction, VT (US);

Robert E. Desrosiers, Essex Junction, VT (US);

Tracy C. Hetrick, Milton, VT (US);

Mousa H. Ishaq, Essex Junction, VT (US);

Inventors:

Joseph K. Comeau, Alburgh, VT (US);

David Crawford, Essex Junction, VT (US);

Robert E. Desrosiers, Essex Junction, VT (US);

Tracy C. Hetrick, Milton, VT (US);

Mousa H. Ishaq, Essex Junction, VT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F04F 9/00 (2006.01); C23C 16/50 (2006.01); C23C 16/455 (2006.01); C23F 1/00 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
F04F 9/00 (2013.01); C23C 16/50 (2013.01); C23C 16/45536 (2013.01); C23C 16/45587 (2013.01); C23C 16/45589 (2013.01); C23F 1/00 (2013.01); H01J 2237/1825 (2013.01); H01J 37/32633 (2013.01); H01J 37/32834 (2013.01);
Abstract

A vacuum trap, a plasma etch system using the vacuum trap and a method of cleaning the vacuum trap. The vacuum trap includes a baffle housing; and a removable baffle assembly disposed in the baffle housing, the baffle assembly comprising a set of baffle plates, the baffle plates spaced along a support rod from a first baffle plate to a last baffle plate, the baffle plates alternately disposed above and below the support rod and alternately disposed in an upper region and a lower region of the baffle housing.

Published as:

Find Patent Forward Citations

Loading…