Toshiyuki Uno

Title: **Toshiyuki Uno: Innovator in EUV Lithography**

Introduction

Toshiyuki Uno, an esteemed inventor based in Tokyo, Japan, has made significant contributions to the field of extreme ultraviolet (EUV) lithography. With an impressive portfolio of 22 patents, his work primarily focuses on the development of advanced reflective mask technologies essential for semiconductor manufacturing.

Latest Patents

Among his notable recent patents is the **Reflective Mask Blank and Reflective Mask**. This invention encompasses a reflective mask blank that comprises a substrate, a reflective layer aimed at reflecting EUV light, a protective layer, and an absorbent layer designed for absorbing EUV light. Notably, the absorbent layer exhibits a reflectance for a wavelength of 13.53 nm that ranges from 2.5% to 10% and comprises both a lower and an upper absorption layer, adhering to a specific thickness relationship.

Another significant patent is the **Reflective Mask Blank for EUV Lithography**, which includes a substrate, a multilayer reflective film responsible for reflecting EUV light, and a phase shift film that adjusts the phase of the EUV light. This phase shift film is composed of a layer incorporating ruthenium (Ru) along with oxygen (O) or nitrogen (N). The diffraction peaks derived from this film reveal critical characteristics, further enhancing the effectiveness of the EUV lithography process.

Career Highlights

Toshiyuki Uno has had a distinguished career with leading companies, including Asahi Glass Company and AGC Inc. His innovative spirit and technical expertise have propelled advancements in the semiconductor industry, specifically in lithography technologies.

Collaborations

Throughout his career, Toshiyuki has collaborated with several talented professionals, including Hiroshi Hanekawa and Kazuyuki Hayashi. These partnerships have fostered a collaborative environment that has significantly enhanced the development and success of his inventions.

Conclusion

Toshiyuki Uno's contributions to EUV lithography not only demonstrate his innovative prowess but also highlight the importance of his work in the semiconductor industry. With a wealth of patents to his name, Uno continues to be a pivotal figure in the evolution of advanced lithographic technologies, paving the way for future advancements in the field.