Osaka, Japan

Toshiyuki Nitta



Average Co-Inventor Count = 1.7

ph-index = 2

Forward Citations = 31(Granted Patents)


Location History:

  • Konohana, JP (1995)
  • Osaka, JP (1995 - 2023)

Company Filing History:


Years Active: 1995-2023

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5 patents (USPTO):Explore Patents

Title: Innovations of Toshiyuki Nitta in Semiconductor Technology

Introduction

Toshiyuki Nitta is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of optical devices. With a total of 5 patents to his name, Nitta's work has had a considerable impact on the industry.

Latest Patents

Nitta's latest patents include a semiconductor optical device and a method for producing such a device. The method involves bonding a semiconductor chip to a silicon-on-insulator (SOI) substrate that has a waveguide. The semiconductor chip contains III-V group compound semiconductors arranged in a specific order, which enhances optical gain. The process includes several steps, such as forming a covered portion with an insulating layer, etching the second cladding layer, and creating a tapered portion on the waveguide. The semiconductor optical device itself features an SOI substrate with a waveguide and at least one gain region of a group III-V compound semiconductor, which is crucial for optical gain.

Career Highlights

Toshiyuki Nitta is currently employed at Sumitomo Electric Industries, Limited, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of optical devices, making them more efficient and effective.

Collaborations

Nitta has collaborated with notable colleagues such as Naoki Fujiwara and Hideki Yagi. Their combined expertise has contributed to the successful development of various semiconductor technologies.

Conclusion

Toshiyuki Nitta's contributions to semiconductor technology, particularly in optical devices, highlight his role as a leading inventor in the field. His innovative methods and collaborations continue to shape the future of semiconductor applications.

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