Toshiyasu Yajima

Title: The Innovations of Toshiyasu Yajima

Introduction

Toshiyasu Yajima is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of polishing technology, holding a total of three patents. His work focuses on improving the efficiency and effectiveness of polishing methods through innovative techniques.

Latest Patents

Yajima's latest patents include a method for polishing using a polishing pad provided with an adsorption layer. This polishing method utilizes a pad that features a specific adsorption layer made from silicone, which includes linear polyorganosiloxane with vinyl groups at both ends. The polishing pad is affixed to a surface plate, allowing a product to be polished to be pressed against it while being slid to achieve the desired finish. The surface roughness of the surface plate is carefully controlled to prevent any unpredictable scratches or roughness on the product being polished. Another notable patent is the design of a holding pad that includes a holding layer for securing a member to be polished. This holding layer features a template fixing portion that prevents lateral displacement, ensuring precision during the polishing process.

Career Highlights

Throughout his career, Toshiyasu Yajima has worked with prominent companies such as Maruishi Sangyo Co. Ltd. and Kuraray Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in polishing technologies.

Collaborations

Yajima has collaborated with several professionals in his field, including Daisuke Ninomiya and Takashi Katayama. These collaborations have fostered innovation and the sharing of ideas, further enhancing the development of polishing methods.

Conclusion

Toshiyasu Yajima's contributions to polishing technology through his patents and collaborations highlight his role as a significant inventor in this field. His innovative methods continue to influence the industry and improve polishing techniques.