Toshiro Tsumori

Title: Toshiro Tsumori: Innovator in Semiconductor Manufacturing

Introduction

Toshiro Tsumori is a notable inventor based in Zama, Japan, recognized for his contributions to semiconductor manufacturing technology. With a total of two patents to his name, Tsumori has made significant advancements in the field, particularly in film-forming apparatuses and methods.

Latest Patents

Tsumori's latest patents include a film-forming manufacturing apparatus and method. This invention aims to prolong the lifetime of heaters used under high-temperature conditions in epitaxial growth techniques. The apparatus features an inert gas discharge portion that supplies an inert gas into the space containing the heater. This design prevents the reaction gas from entering the space with high-temperature heaters, thereby avoiding reactions that could degrade the heaters.

Another significant patent is the semiconductor substrate manufacturing apparatus, which facilitates epitaxial growth. In this apparatus, gases are supplied to a wafer placed on a susceptor, with a heater located on the back surface of the susceptor. This setup allows for the deposition of SiC film onto the susceptor, which can then be removed to enhance manufacturing yield.

Career Highlights

Throughout his career, Toshiro Tsumori has worked with prominent companies such as Nuflare Technology, Inc. and Denso Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Tsumori has collaborated with notable colleagues, including Kunihiko Suzuki and Shinichi Mitani. These partnerships have likely fostered a creative environment that has led to advancements in their respective fields.

Conclusion

Toshiro Tsumori's work in semiconductor manufacturing has made a lasting impact on the industry. His innovative patents and career achievements highlight his role as a key figure in advancing technology.