This inventor holds 4 USPTO granted patents. Top assignees: Fujikoshi Machinery Corp., Tokyo Seimitsu Co., Ltd., Toshiro Doy. Active years: 2005-2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Saitama, JP (2005)
- Tokorozawa, JP (2006)
- Tokorozawa-shi, Saitama, JP (2007)
- Fukuoka-shi, Fukuoka, JP (2010)
Company Filing History:
2 out of 71 
2 out of 326 
1 out of 1 Years Active: 2005-2010
Title: Toshiro Doi: Innovator in Chemical Mechanical Polishing
Introduction
Toshiro Doi is a prominent inventor based in Fukuoka, Japan. He has made significant contributions to the field of chemical mechanical polishing, holding a total of 4 patents. His innovative approaches have advanced the technology used in polishing devices, enhancing their efficiency and effectiveness.
Latest Patents
One of Doi's latest patents is a method and apparatus for chemical mechanical polishing. This invention features a polishing device that is hermetically sealed within a chamber containing an atmosphere different from ambient air. By applying voltage between a wafer and a polishing pad, the wafer is polished with an electrolytic effect. The controlled atmosphere, which contains extremely low levels of oxygen, prevents oxidation of the wafer's surface, ensuring a consistent polishing rate.
Another notable patent is the polishing apparatus and method for polishing a workpiece. This apparatus can adjust the pH value of the slurry to modify the polishing rate while achieving high flatness on the workpiece. The design includes a pressure vessel, a polishing plate, a pressing plate, and a driving unit that moves the polishing plate relative to the pressing plate. Additionally, it features a gas supplying source that introduces either an alkaline or acid gas into the pressure vessel, allowing for precise control over the slurry's pH.
Career Highlights
Throughout his career, Toshiro Doi has worked with notable companies, including Tokyo Seimitsu Co., Ltd. His work has been instrumental in developing advanced polishing technologies that are widely used in various industries.
Collaborations
Doi has collaborated with esteemed colleagues such as Takashi Fujita and Ara Philipossian. Their combined expertise has contributed to the success of his innovative projects.
Conclusion
Toshiro Doi's contributions to the field of chemical mechanical polishing have established him as a leading inventor in this domain. His patents reflect a commitment to innovation and excellence in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile