Toshio Konishi

This inventor holds 4 USPTO granted patents. Top assignees: Toppan Printing Co., Ltd., Nikon Corporation. Active years: 1995-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshio Konishi. Retrieved from https://idiyas.com/inventor/toshio-konishi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4

% Patents Active = 50.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 58(Granted Patents)

Location History:

Minamisaitama-gun, JP (2009)
Tokyo, JP (1995 - 2010)

Company Filing History:

3 out of 1,269

Toppan Printing Co., Ltd.

Years Active: 1995-2010

Loading Chart...

4 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7754397 - Phase-shift mask, manufacturing method thereof and manufacturing method of semiconductor element (2010-07-13),

2. 7632613 - Levenson type phase shift mask and manufacturing method thereof (2009-12-15),

3. 6638666 - Substrate for a transfer mask, transfer mask, and method of manufacturing the transfer mask (2003-10-28),

4. 5462806 - Plastic lens (1995-10-31),

Title: Innovations of Toshio Konishi

Introduction

Toshio Konishi is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on advanced manufacturing methods and innovative designs that enhance the functionality of phase-shift masks.

Latest Patents

Among his latest patents is a phase-shift mask that includes a transparent substrate and a light-shielding film. This film is designed with first and second apertures that are alternately arranged. The transparent substrate is partially removed through the second apertures to create a recessed portion with a predetermined depth. This design allows light transmitted through the first and second apertures to alternately invert in phase. Another significant patent is the Levenson type phase shift mask, which features a light shielding portion and openings on a transparent substrate. The design includes shifter openings that invert the phase of transmitted light, enhancing the mask's performance.

Career Highlights

Toshio Konishi has worked with prominent companies such as Toppan Printing Co., Ltd. and Nikon Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor manufacturing.

Collaborations

He has collaborated with notable coworkers, including Yosuke Kojima and Jun Sasaki, contributing to various projects that have advanced the field of semiconductor technology.

Conclusion

Toshio Konishi's contributions to the field of semiconductor technology through his patents and collaborations highlight his innovative spirit and dedication to advancing manufacturing methods. His work continues to influence the industry and pave the way for future developments.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]