The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2009
Filed:
Oct. 20, 2006
Yosuke Kojima, Niiza, JP;
Toshio Konishi, Minamisaitama-gun, JP;
Keishi Tanaka, Kasukabe, JP;
Masao Otaki, Minamisaitama-gun, JP;
Jun Sasaki, Kasukabe, JP;
Yosuke Kojima, Niiza, JP;
Toshio Konishi, Minamisaitama-gun, JP;
Keishi Tanaka, Kasukabe, JP;
Masao Otaki, Minamisaitama-gun, JP;
Jun Sasaki, Kasukabe, JP;
Toppan Printing Co., Ltd., Tokyo, JP;
Abstract
A Levenson type phase shift mask has a light shielding portion and openings formed on a transparent substrate. The transparent substrate at the openings is partially dug in or a transparent film is partially disposed on the transparent substrate at the openings to form shifter openings and non-shifter openings. The shifter openings and the non-shifter openings repetitively exist in the mask. The shifter openings invert a phase of transmitted light. The Levenson type phase shift mask has a light shielding portions pattern interposed from both sides between the adjacent openings of the same kind. The light shielding portions pattern is subjected to bias correction which expands the light shielding portions pattern to both sides thereof in a predetermined amount with respect to a predetermined design line width set by a design of the mask.