Masao Otaki

Title: Masao Otaki: Innovator in Phase Shift Mask Technology

Introduction

Masao Otaki is a prominent inventor based in Minamisaitama-gun, Japan. He is known for his significant contributions to the field of optical technology, particularly in the development of phase shift masks. His innovative work has led to advancements in photolithography, which is crucial for semiconductor manufacturing.

Latest Patents

Masao Otaki holds a patent for the "Levenson type phase shift mask and manufacturing method thereof." This invention features a light shielding portion and openings formed on a transparent substrate. The transparent substrate at the openings is partially dug in, or a transparent film is partially disposed on the transparent substrate at the openings to create shifter openings and non-shifter openings. The shifter openings invert a phase of transmitted light, enhancing the mask's functionality. The design includes a light shielding portions pattern that is subjected to bias correction, expanding the pattern to both sides in a predetermined amount.

Career Highlights

Otaki has made significant strides in his career, particularly through his work at Toppan Printing Co., Ltd. His expertise in optical technologies has positioned him as a key figure in the development of advanced photolithographic techniques. His innovative approach has contributed to the efficiency and effectiveness of semiconductor production processes.

Collaborations

Masao Otaki has collaborated with notable colleagues, including Yosuke Kojima and Toshio Konishi. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Masao Otaki's contributions to the field of phase shift mask technology exemplify his innovative spirit and dedication to advancing optical technology. His work continues to influence the semiconductor industry, paving the way for future innovations.