The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
Jun. 14, 2007
Toshio Konishi, Tokyo, JP;
Yosuke Kojima, Tokyo, JP;
Satoru Nemoto, Tokyo, JP;
Jun Sasaki, Tokyo, JP;
Keishi Tanaka, Tokyo, JP;
Toshio Konishi, Tokyo, JP;
Yosuke Kojima, Tokyo, JP;
Satoru Nemoto, Tokyo, JP;
Jun Sasaki, Tokyo, JP;
Keishi Tanaka, Tokyo, JP;
Toppan Printing Co., Ltd., Tokyo, JP;
Abstract
A phase-shift mask including a transparent substrate, and a light-shielding film formed on the transparent substrate and provided with first apertures and second apertures which are alternately arranged. The transparent substrate is partially removed through the second apertures to form a recessed portion having a predetermined depth. Light transmitted through the first apertures and light transmitted through the second apertures are enabled to alternately invert in phase thereof. This phase-shift mask is characterized in that a phase shift of transmitted light is set in conformity with a pitch between an edge of the first aperture and an edge of the second aperture of the light-shielding film.