Sanda, Japan

Toshinori Ishii


Average Co-Inventor Count = 7.3

ph-index = 8

Forward Citations = 530(Granted Patents)


Location History:

  • Hyohgo-ken, JP (2000)
  • Sanda, JP (1994 - 2006)
  • Osaka, JP (2010)

Company Filing History:


Years Active: 1994-2010

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10 patents (USPTO):

Title: The Innovative Contributions of Toshinori Ishii

Introduction

Toshinori Ishii is a prominent inventor based in Sanda, Japan. He has made significant contributions to the field of technology, particularly in the development of advanced materials and devices. With a total of 10 patents to his name, Ishii's work has had a considerable impact on various industries.

Latest Patents

One of his latest inventions is a silicon electrode plate for plasma etching with superior durability. This innovative plate includes silicon single crystal that contains 3 to 11 ppba of boron, along with a total of 0.5 to 6 ppba of either or both phosphorus and arsenic. Another notable patent is a contact probe and probe device. This device features a contact probe that includes a film and multiple wiring patterns, each with front end portions projecting from the film to form contact pins. The design allows for enhanced connectivity and functionality in electronic applications.

Career Highlights

Throughout his career, Toshinori Ishii has worked with several reputable companies, including Genesis Technology Inc. and Mitsubishi Materials Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking projects.

Collaborations

Ishii has collaborated with notable colleagues such as Hideaki Yoshida and Atushi Matsuda. These partnerships have fostered innovation and have led to the successful development of various technologies.

Conclusion

Toshinori Ishii's contributions to the field of technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in materials and devices, showcasing the importance of innovation in today's world.

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