Company Filing History:
Years Active: 2020-2025
Title: Innovations of Toshinori Debari
Introduction
Toshinori Debari is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of etching methods and apparatuses, holding a total of 2 patents. His work is primarily associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry.
Latest Patents
Debari's latest patents include innovative techniques that enhance the etching process. The first patent describes an etching method and apparatus that involves providing a substrate with a three-layered film. This film consists of a first silicon oxide-based film, a silicon nitride-based film, and a second silicon oxide-based film. The method allows for the collective etching of these layers using a HF—NH-based gas while adjusting the gas ratio for optimal results.
The second patent focuses on an etching method and residue removal technique for silica-based residues formed in an SiO film. This method selectively etches the residue by supplying an HF gas, an HO gas, or an alcohol gas to the target substrate. After the etching process, the residue is removed through a two-step process involving the supply of HO or alcohol gas followed by heating the substrate.
Career Highlights
Throughout his career, Toshinori Debari has demonstrated a commitment to advancing etching technologies. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing. His work has contributed to improving the efficiency and effectiveness of etching processes in the industry.
Collaborations
Debari has collaborated with several talented individuals in his field, including Noriyuki Kobayashi and Reiko Sasahara. These collaborations have likely fostered innovation and the exchange of ideas, further enhancing the quality of his work.
Conclusion
Toshinori Debari's contributions to etching methods and apparatuses have made a significant impact in the semiconductor industry. His innovative patents and collaborations highlight his dedication to advancing technology in this field.