Tokyo, Japan

Toshimitsu Barada

USPTO Granted Patents = 20 

 

Average Co-Inventor Count = 2.7

ph-index = 7

Forward Citations = 100(Granted Patents)


Location History:

  • Kanagawa-ken, JP (2004)
  • Tokyo, JP (2001 - 2023)

Company Filing History:


Years Active: 2001-2025

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20 patents (USPTO):

Title: Toshimitsu Barada: Innovator in Substrate Processing Technology

Introduction

Toshimitsu Barada, an accomplished inventor based in Tokyo, Japan, has made significant contributions to the field of substrate processing technology. With a portfolio of 19 patents, Barada's innovations are primarily focused on improving efficiency and effectiveness in substrate rotation and cleaning processes. His engineering expertise has made him a notable figure in the innovation landscape.

Latest Patents

Barada's latest patents reflect his commitment to advancing substrate processing mechanisms. Among them are:

1. **Substrate Rotation Device** - An advanced device designed for precise substrate rotation, featuring an outer cylinder and an inner cylinder. Utilizing a radial motor and magnetic bearing, it ensures optimal performance in substrate handling.

2. **Substrate Cleaning Device** - A dedicated device aimed at maintaining the cleanliness of substrates during processing, ensuring high quality and precision.

3. **Substrate Processing Device** - This device integrates various functions to streamline the substrate treatment process, enhancing overall productivity.

4. **Control Method for Substrate Rotation Device** - A method developed to facilitate the control of the substrate rotation device, ensuring smooth operation and reliability.

Career Highlights

Toshimitsu Barada has demonstrated his engineering prowess through various roles in major companies, including Ebara Corporation. His work has significantly influenced advancements in substrate processing technology, leading to improved system designs and innovations.

Collaborations

Throughout his career, Barada has collaborated with notable colleagues like Shinichi Sekiguchi and Toshiharu Nakazawa. Together, they have shared knowledge and expertise that has further propelled their innovative projects in the industry.

Conclusion

In summary, Toshimitsu Barada is a prominent inventor whose contributions to substrate processing technology continue to shape the industry. With a robust portfolio of patents and a history of collaboration with esteemed professionals, his work demonstrates the impact of innovation in engineering and technology advancement.

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