Tokyo, Japan

Toshimasa Kameda

USPTO Granted Patents = 3 

Average Co-Inventor Count = 3.7

ph-index = 1


Company Filing History:


Years Active: 2020-2025

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3 patents (USPTO):Explore Patents

Title: Innovations of Toshimasa Kameda

Introduction

Toshimasa Kameda is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of pattern measurement and charged particle beam technology. With a total of 3 patents, Kameda's work focuses on enhancing measurement accuracy and image quality in various applications.

Latest Patents

Kameda's latest patents include a pattern measurement system, a pattern measurement method, and a program for measuring edge roughness at the edge of a pattern based on a random noise component. This innovative technique allows for the detection of a random noise component with high accuracy, overcoming measurement pattern limitations. The method involves performing pattern matching and edge position correction for both the left and right edges of a line pattern in an image. By generating an image devoid of roughness, Kameda's approach measures the average PSD value of all frequencies to determine the random noise component accurately. Additionally, he has developed a charged particle beam apparatus designed to obtain focused images on sample surfaces while preventing visual field deviations. This apparatus forms multiple images based on different energy charged particles, allowing for precise corrections in imaging.

Career Highlights

Throughout his career, Kameda has worked with prominent companies such as Hitachi High-Technologies Corporation and Hitachi High-Tech Corporation. His experience in these organizations has contributed to his expertise in advanced measurement systems and imaging technologies.

Collaborations

Kameda has collaborated with notable colleagues, including Kei Sakai and Junichi Kakuta. Their combined efforts have furthered the development of innovative technologies in their respective fields.

Conclusion

Toshimasa Kameda's contributions to pattern measurement and charged particle beam technology highlight his role as a leading inventor in Japan. His innovative patents and collaborations reflect his commitment to advancing measurement accuracy and imaging quality.

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