The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2020
Filed:
Mar. 04, 2019
Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;
Yasunori Takasugi, Tokyo, JP;
Satoru Yamaguchi, Tokyo, JP;
Kei Sakai, Tokyo, JP;
Hideki Itai, Tokyo, JP;
Yoshinori Momonoi, Tokyo, JP;
Toshimasa Kameda, Tokyo, JP;
Yoshihiro Kimura, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
Provided is a charged particle beam apparatus, aiming at obtaining an image and the like focused on the sample surface and the bottom while preventing the visual field deviation occurred when focusing on the sample surface and the bottom respectively. The charged particle beam apparatus forms a first image (), which is based on detection of the first energy charged particles, based on an irradiation with a beam whose focus is adjusted on a sample surface side, forms a second image () which is based on detection of second energy charged particles having a relatively higher energy than the first energy and a third image () which is based on the detection of the first energy charged particles, based on the irradiation with a beam whose focus is adjusted on a bottom side of a pattern included in the sample, acquires a deviation between the first image and the third image, and composes the first image and the second image so as to correct the deviation.