This inventor holds 3 USPTO granted patents. Top assignees: Mitsubishi Electric Engineering Company, Limited, Renesas Technology Corp., Other. Active years: 2004-2006.
Location History:
- Tokyo, JP (2004)
- Hyogo, JP (2005 - 2006)
Company Filing History:
2 out of 177 
2 out of 3,781 
1 out of 834,350 Years Active: 2004-2006
Title: Toshiki Oono: Innovator in Semiconductor Technology
Introduction
Toshiki Oono is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on improving manufacturing processes and equipment for semiconductors.
Latest Patents
Oono's latest patents include a centrifugal dryer and a gas analyzing method for semiconductor treaters. The centrifugal dryer is designed to perform drying processing for multiple substrates. It features a chamber that holds the substrates and a cradle that rotates them for effective drying. Additionally, it incorporates an elastic wave sensor to detect impacts during the drying process. His gas analyzer for semiconductor treaters enhances the ability to monitor gas composition changes that could affect semiconductor treatment. This device includes a duct for gas extraction, a gas analytic chamber, and a spectrometer for analyzing the plasma emissions of the gas.
Career Highlights
Throughout his career, Toshiki Oono has worked with prominent companies such as Renesas Technology Corporation and Mitsubishi Electric Engineering Company, Limited. His experience in these organizations has contributed to his expertise in semiconductor manufacturing.
Collaborations
Oono has collaborated with notable colleagues, including Hirotoshi Ise and Minoru Hanazaki. Their joint efforts have likely fostered innovation and advancements in their respective fields.
Conclusion
Toshiki Oono's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively.