Tokyo, Japan

Toshikazu Akimoto

This inventor holds 1 USPTO granted patent and 9 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshikazu Akimoto. Retrieved from https://idiyas.com/inventor/toshikazu-akimoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Toshikazu Akimoto

Introduction

Toshikazu Akimoto is a prominent inventor based in Tokyo, Japan. He is known for his significant contributions to the field of substrate processing technology. With a focus on enhancing the efficiency and effectiveness of processing apparatuses, Akimoto has made strides in the industry.

Latest Patents

Akimoto holds a patent for an "Apparatus for processing substrate, gas shower head, and method for processing substrate." This innovative apparatus is designed to process a substrate by supplying a processing gas within a processing container. The key components of this invention include a mounting table for the substrate, a gas shower head with a gas diffusion space, and a controller that adjusts the flow rate of the processing gas. This invention aims to improve the precision and control of substrate processing.

Career Highlights

Akimoto is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at Tokyo Electron has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in technology.

Collaborations

One of Akimoto's notable coworkers is Naoki Umeshita. Together, they have worked on various projects that aim to push the boundaries of substrate processing technology.

Conclusion

Toshikazu Akimoto's innovative work and patent in substrate processing highlight his role as a key figure in the field. His contributions continue to influence advancements in technology and improve processing methods in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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