Location History:
- Nirasaki, JP (2009 - 2012)
- Miyagi, JP (2017)
Company Filing History:
Years Active: 2009-2017
Title: The Innovative Contributions of Toshihiko Shindo
Introduction
Toshihiko Shindo is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 5 patents. His work focuses on methods that enhance the efficiency and effectiveness of plasma processing in various applications.
Latest Patents
One of Shindo's latest patents is a method of processing a target object. This plasma processing method can suppress both surface roughness of wiring and surface roughness of a metal mask. The method involves generating plasma from a first processing gas that contains a fluorocarbon gas and/or a hydrofluorocarbon gas to etch a diffusion barrier film until a copper wiring is exposed. Additionally, it includes generating plasma from a second processing gas containing a carbon-containing gas to form an organic film on the surface of the target object after the diffusion barrier film is etched.
Another notable patent is related to a plasma processing method and apparatus. This method performs a plasma process on a substrate by making a plasma act on it. The process includes several sequential steps, such as making a weaker plasma act on the substrate, applying a DC voltage to an electrostatic chuck to attract and hold the substrate, extinguishing the weak plasma, and then performing the plasma process. The associated apparatus includes a plasma processing mechanism and a controller to manage the plasma processing method.
Career Highlights
Toshihiko Shindo is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at this organization has allowed him to develop and refine his innovative plasma processing techniques.
Collaborations
Shindo has collaborated with notable colleagues, including Shin Okamoto and Kimihiro Higuchi. Their combined expertise has contributed to advancements in plasma processing technologies.
Conclusion
Toshihiko Shindo's contributions to plasma processing technology are noteworthy, with several patents that enhance the efficiency of manufacturing processes. His work continues to influence the field and drive innovation forward.