Toshihiko Onozuka

Title: Innovations of Toshihiko Onozuka

Introduction

Toshihiko Onozuka is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative techniques. His work focuses on improving manufacturing processes and product accuracy in the semiconductor industry.

Latest Patents

Onozuka's latest patents include a phase shift mask and methods for forming asymmetric patterns, manufacturing diffraction gratings, and semiconductor devices. One of his key techniques involves using a phase shift mask to form an asymmetric pattern, which enhances product accuracy and reduces manufacturing time. In his method for manufacturing a diffraction grating, light from an illumination source is transmitted through the phase shift mask, creating interference patterns that expose a photoresist on a silicon wafer. This process results in a diffraction grating with a blazed cross-sectional shape. Additionally, he has developed a process for the removal of resist layers from semiconductor substrates, ensuring that the gate oxide layer remains undamaged during the removal process.

Career Highlights

Throughout his career, Onozuka has worked with prominent companies such as Nitto Denko Corporation and Hitachi High-Technologies Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Onozuka has collaborated with notable colleagues, including Seiichirou Shirai and Takayuki Noishiki. Their combined expertise has furthered the development of innovative solutions in the semiconductor field.

Conclusion

Toshihiko Onozuka's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the industry. His innovative methods continue to influence manufacturing processes and product development.