Miyagi, Japan

Toshihiko Hamada

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshihiko Hamada. Retrieved from https://idiyas.com/inventor/toshihiko-hamada-1695dckk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: The Innovations of Toshihiko Hamada

Introduction

Toshihiko Hamada is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of substrate processing technology. His work has led to advancements that enhance the efficiency and effectiveness of substrate processing methods.

Latest Patents

Hamada holds a patent for a "Substrate processing apparatus, substrate processing method and recording medium recording substrate processing program." This innovative apparatus includes at least one process module designed to process first substrates. It features a position detector that detects the first positions of these substrates. Additionally, a control unit is responsible for managing the position detector to measure the second position of a selected second substrate from the first substrates, based on a measurement interval set for the same process module. This patent showcases his expertise in developing advanced processing technologies.

Career Highlights

Toshihiko Hamada is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His role at the company has allowed him to work on cutting-edge technologies that are crucial for modern electronics.

Collaborations

Hamada has collaborated with notable colleagues such as Yoshikazu Ishikawa and Shouichi Otake. These partnerships have contributed to the development of innovative solutions in substrate processing.

Conclusion

Toshihiko Hamada's contributions to substrate processing technology are significant and impactful. His patent and work at Tokyo Electron Limited highlight his role as a key innovator in the field. His collaborations further enhance the advancements in this important area of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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