The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2017
Filed:
Dec. 16, 2015
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Masahiro Numakura, Miyagi, JP;
Yoshikazu Ishikawa, Miyagi, JP;
Toshihiko Hamada, Miyagi, JP;
Junya Sato, Miyagi, JP;
Toshiyuki Kobayashi, Miyagi, JP;
Shouichi Otake, Miyagi, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 31/26 (2014.01); H01L 21/66 (2006.01); H01J 37/32 (2006.01); H01L 21/677 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32009 (2013.01); H01L 21/67259 (2013.01); H01L 21/67276 (2013.01); H01L 21/67253 (2013.01); H01L 21/67742 (2013.01);
Abstract
A substrate processing apparatus includes at least one process module configured to process first substrates. A position detector is configured to detect first positions of the first substrates. A control unit is configured to control the position detector so as to measure a second position of a second substrate selected from the first substrates to be processed in a same process module depending on a measurement interval set for the same process module.