Company Filing History:
Years Active: 2003-2011
Title: Toshihide Ieki: Innovator in Plasma CVD Technology
Introduction
Toshihide Ieki is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of plasma chemical vapor deposition (CVD) technology. With a total of 5 patents to his name, Ieki has developed innovative methods that enhance the performance and durability of vapor deposited films.
Latest Patents
One of Ieki's latest patents involves a vapor deposited film formed by the plasma CVD method. This film is created using an organic metal compound and an oxidizing gas as reactive gases. The resulting vapor deposited film consists of three distinct sections: a base material side adhesive layer with 5% or more carbon, a barrier intermediate layer with less than 5% carbon, and a surface protection film with 5% or more carbon. This unique composition provides excellent adhesiveness to the base material and remarkable resistance to water, particularly in alkaline aqueous solutions.
Another notable patent by Ieki details a method for forming a metal oxide film using the plasma CVD method. This process involves reacting an organometal through glow discharge in a low output region, followed by a reaction with an oxidizing gas in a high-output region. The outcome is a thin film that exhibits excellent adhesiveness, softness, and flexibility on the surface of a plastic substrate.
Career Highlights
Toshihide Ieki is currently employed at Toyo Seikan Kaisha, Ltd., where he continues to push the boundaries of innovation in his field. His work has garnered attention for its practical applications and contributions to advanced materials technology.
Collaborations
Ieki has collaborated with notable colleagues, including Tsunehisa Namiki and Hideo Kurashima. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Toshihide Ieki's contributions to plasma CVD technology exemplify his commitment to innovation and excellence. His patents reflect a deep understanding of material science and a dedication to improving industrial applications.