The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2011
Filed:
Feb. 07, 2006
Hajime Inagaki, Yokohama, JP;
Toshihide Ieki, Yokohama, JP;
Satoru Kitou, Yokohama, JP;
Ryuta Nakano, Yokohama, JP;
Megumi Nakayama, Yokohama, JP;
Hajime Inagaki, Yokohama, JP;
Toshihide Ieki, Yokohama, JP;
Satoru Kitou, Yokohama, JP;
Ryuta Nakano, Yokohama, JP;
Megumi Nakayama, Yokohama, JP;
Toyo Seikan Kaisha, Ltd., Tokyo, JP;
Abstract
A vapor deposited film is formed on a base material surface by a plasma CVD method where an organic metal compound and an oxidizing gas are used as a reactive gas. The vapor deposited film has three sections of a base material side adhesive layer having 5% or more carbon, a barrier intermediate layer having less than 5% carbon, and a surface protection film having 5% or more carbon, by element concentration with respect to the total amount of three elements of a metal element (M), oxygen (O) and carbon (C) derived from the organic metal compound. The vapor deposited film has excellent adhesiveness to the base material, and has excellent resistance to water, especially to alkaline aqueous solutions, as well.