Company Filing History:
Years Active: 2011
Title: Satoru Kitou: Innovator in Vapor Deposited Film Technology
Introduction
Satoru Kitou is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of materials science, particularly in the development of vapor deposited films. His innovative work has led to the creation of a unique film that enhances the performance of various applications.
Latest Patents
Satoru Kitou holds a patent for a vapor deposited film formed by a plasma CVD method. This method utilizes an organic metal compound and an oxidizing gas as reactive gases. The resulting vapor deposited film consists of three distinct sections: a base material side adhesive layer with 5% or more carbon, a barrier intermediate layer with less than 5% carbon, and a surface protection film with 5% or more carbon. This innovative film exhibits excellent adhesiveness to the base material and remarkable resistance to water, particularly in alkaline aqueous solutions. He has 1 patent to his name.
Career Highlights
Satoru Kitou is currently employed at Toyo Seikan Kaisha, Ltd., where he continues to advance his research and development efforts. His work has been instrumental in enhancing the performance and durability of vapor deposited films, making them suitable for a variety of industrial applications.
Collaborations
Throughout his career, Satoru has collaborated with esteemed colleagues such as Hajime Inagaki and Toshihide Ieki. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Satoru Kitou's contributions to the field of vapor deposited films exemplify the impact of innovative thinking in materials science. His patented technology not only enhances product performance but also showcases the importance of collaboration in driving advancements in the industry.